Acid‐Base Properties of Passive Films on Aluminum: II. An X‐Ray Photoelectron Spectroscopy and X‐Ray Absorption Near Edge Structure Study-Reference-Cited by-同舟云学术

Acid‐Base Properties of Passive Films on Aluminum: II. An X‐Ray Photoelectron Spectroscopy and X‐Ray Absorption Near Edge Structure Study

Published:1998-03-01 Issue:3 Volume:145 Page:829-834
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Lopez Sébastien¹²³,Petit Jean‐Pierre¹²³,Tourillon Gérard¹²³,Dunlop Hugh M.¹²³,Butruille Jean‐Rémi¹²³

Affiliation:

1. Laboratoire d'Electrochimie et de Physico‐Chimie des Matériaux et Interfaces, UMR 5631 CNRS‐INPG, F‐38402 Saint‐Martin d'Hères, France

2. Laboratoire de Cristallographie‐CNRS, F‐38042 Grenoble Cedex 09, France

3. Pechiney Centre de Recherches de Voreppe, F‐38340 Voreppe, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1838352/pdf

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