Chemical Solution Deposition of Al(OH) 3 ‐AlOOH Films: Application for Surface Sensitizing of Rigid and Flexible Substrates to Improve the Adhesion in Coating Technology Areas-Reference-Cited by-同舟云学术

Chemical Solution Deposition of Al(OH) 3 ‐AlOOH Films: Application for Surface Sensitizing of Rigid and Flexible Substrates to Improve the Adhesion in Coating Technology Areas

Published:2021-06-24 Issue:24 Volume:6 Page:6083-6096
ISSN:2365-6549
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language:en
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Author:

Cota‐Leal Marcos¹²,García‐Valenzuela Jorge A.²³⁴^ORCID

Affiliation:

1. Centro de Nanociencias y Nanotecnología Universidad Nacional Autónoma de México Km 107 Carretera Tijuana-Ensenada, Apdo. Postal 356 C.P. 22800 Ensenada Baja California Mexico

2. SMARTER-Lab Nucleus for Research & Divulgation A.C. Blvd. Eusebio Francisco Kino No. 848, C.P. 83150 Hermosillo Sonora Mexico

3. Programa Educativo de Licenciatura en Criminología Universidad Estatal de Sonora Av. Ley Federal del Trabajo y Calle Israel González S/N C.P. 83100 Hermosillo Sonora Mexico

4. Departamento de Ciencias Químico Biológicas Universidad de Sonora Calle Rosales y Blvd. Luis Encinas Johnson S/N C.P. 83000 Hermosillo Sonora Mexico

Publisher

Wiley

Subject

General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/slct.202101449

Reference114 articles.

1. On the Adherence of Chemically Deposited CdS Films to Common Inorganic Substrates: Effect of Cd 2+ Concentration in Solution, Substrate Surface Chemistry, and Reaction Temperature

2. Review Lecture: The float glass process

3. Mössbauer spectra of tin in float glass

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