The Effect of Low and High Temperature Anneals on the Hydrogen Content and Passivation of Si Surface Coated with SiO2 and SiN Films-Reference-Cited by-同舟云学术

The Effect of Low and High Temperature Anneals on the Hydrogen Content and Passivation of Si Surface Coated with SiO2 and SiN Films

Published:1999-05-01 Issue:5 Volume:146 Page:1921-1924
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Ebong A.¹,Doshi P.¹,Narashimha S.¹,Rohatgi A.¹,Wang J.²,El‐Sayed M. A.²

Affiliation:

1. University Center of Excellence for Photovoltaics Research and Education, School of Electrical and Computer Engineering

2. Laser Dynamics Laboratory, School of Chemistry and Biochemistry, Georgia Institute of Technology, Atlanta, Georgia 30332, United States of America

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1391866/pdf

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