Characterization and Optimization of a Single Wafer Downstream Plasma Stripper-Reference-Cited by-同舟云学术

Characterization and Optimization of a Single Wafer Downstream Plasma Stripper

Published:1988-09-01 Issue:9 Volume:135 Page:2338-2341
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Kalnitsky A.¹²,Chung W. K.¹²

Affiliation:

1. Northern Telecom Electronics Limited, Ottawa, Ontario, K1Y 4H7 Canada

2. Branson/IPC, Hayward, California 94544

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2096266/pdf

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