(Invited) Molecular Layer Deposition

Abstract

Molecular Layer Deposition (MLD) is analogous to Atomic Layer Deposition (ALD) but using organic precursors and forming completely organic thin films. It has many of the advantages of ALD in terms of uniformity and controllability but also some disadvantages due to the nature of the precursors and film material. This paper gives a review of the limited amount of work which has been carried out to date on MLD since its initiation in the 1990s. It covers the polymeric materials which have been deposited and describes the various processes and precursors which have been used. Some of the difficulties peculiar to MLD are considered and also some of the process developments which have been made to try to overcome these.