Molecular layer deposition (MLD) for lightwave control and extended applications-Reference-Cited by-同舟云学术

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Molecular layer deposition (MLD) for lightwave control and extended applications

Published:2024-09 Issue: Volume:39 Page:101202
ISSN:2352-507X
Container-title:Nano-Structures & Nano-Objects
language:en
Short-container-title:Nano-Structures & Nano-Objects

Author:

Yoshimura Tetsuzo

Publisher

Elsevier BV

Reference147 articles.

1. Atomic layer epitaxy;Suntola;Mater. Sci. Rep.,1989

2. Polymer films formed with monolayer growth steps by molecular layer deposition;Yoshimura;Appl. Phys. Lett.,1991

3. Quantum wire and dot formation by chemical vapor deposition and molecular layer deposition of one-dimensional conjugated polymer;Yoshimura;Appl. Phys. Lett.,1992

4. Demonstration of an imide coupling reaction on a Si(100)-2×1 surface by molecular layer deposition;Bitzer;Appl. Phys. Lett.,1997

5. In-situ study on alternating vapor deposition polymerization of alkyl polyamide with normal molecular orientation;Kubono;Thin Solid Films,1996

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