Author:
Mun Seong Yeol,Shin Kyeong Cheol,Choi Woon Il,Kim Jae Young,Kim Dae Byung,Kang Seong Jun,Jeong Yang Hee
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. S. Rangan, S. Krishnan, A. Amerasekara, S. Aur, and S. Ashok , inProceedings of the Reliability Physics Symposium, IEEE, p. 370 (1999).
2. Thin-oxide damage from gate charging during plasma processing
3. Modeling of oxide breakdown from gate charging during resist ashing
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