Effect of Chelating Agent on Reducing Galvanic Corrosion between Cobalt and Copper in Alkaline Slurry
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference21 articles.
1. Seed layer enhancement by electrochemical deposition: The copper seed solution for beyond 45nm
2. CVD of cobalt-tungsten alloy film as a novel copper diffusion barrier [J];Shimizu;Microelectronic Engineering,2011
3. Effect of ionic strength on ruthenium CMP in H2O2-based slurries
4. Synergetic effect of potassium molybdate and benzotriazole on the CMP of ruthenium and copper in KIO 4 -based slurry
5. Solid-state processing of oxidation-resistant molybdenum borosilicide composites for ultra-high-temperature applications
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. DFT Exploration of Metal Ion–Ligand Binding: Toward Rational Design of Chelating Agent in Semiconductor Manufacturing;Molecules;2024-01-08
2. Effect of oxalic acid (complexing agent) on anodic dissolution of Cobalt in hydrogen peroxide solutions: mechanism and kinetic analysis by electrochemical impedance spectroscopy;Journal of Solid State Electrochemistry;2023-01-17
3. Controlling Galvanic Corrosion with Oxalic Acid and Imidazole for Chemical Mechanical Planarization of Cobalt-Copper Interface;ECS Journal of Solid State Science and Technology;2022-05-01
4. Study of novel chelator and 1, 2, 4-triazole on cobalt corrosion and Co/Cu surface finishing in barrier CMP;Materials Chemistry and Physics;2022-02
5. Heat Treatment Effect in the Corrosion Resistance of the Al-Co-Mn Alloys Immersed in 3 M KOH;International Journal of Corrosion;2021-11-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3