Study of novel chelator and 1, 2, 4-triazole on cobalt corrosion and Co/Cu surface finishing in barrier CMP-Reference-Cited by-同舟云学术

Study of novel chelator and 1, 2, 4-triazole on cobalt corrosion and Co/Cu surface finishing in barrier CMP

Published:2022-02 Issue: Volume:278 Page:125630
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Yang Xiaofan,Zhang Baoguo^ORCID,Yang Zhaoxia

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference37 articles.

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3. Role of additive in alkaline slurries for Co CMP[J];Jun;ECS J. Solid State Sci. Technol.,2017

4. CVD of cobalt-tungsten alloy film as a novel copper diffusion barrier [J];Shimizu;Microelectron. Eng.,2013

5. Synergetic effect of potassium molybdate and benzotriazole on the CMP of ruthenium and copper in KIO4-based slurry [J];Cheng;Appl. Surf. Sci.,2014

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