Emerging Molecular and Atomic Level Techniques for Nanoscale Applications
Author:
Publisher
The Electrochemical Society
Subject
Electrochemistry
Link
https://iopscience.iop.org/article/10.1149/2.F07184if/pdf
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Simplified CVD route to near-zero thickness silicon nitride films;Journal of Vacuum Science & Technology B;2022-07
2. The low-temperature remote-plasma-activated pulsed chemical vapor deposition route to SiNx from 1,3,5-tri(isopropyl)cyclotrisilazane;Thin Solid Films;2020-10
3. Understanding Molecular Layer Deposition Growth Mechanisms in Polyurea via Picosecond Acoustics Analysis;Chemistry of Materials;2020-01-22
4. Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications;ECS Journal of Solid State Science and Technology;2020-01-08
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