Chemically Deposited Ni‐P and Ni‐P‐W Layers Investigated by Means of Rutherford Backscattering Spectrometry-Reference-Cited by-同舟云学术

Chemically Deposited Ni‐P and Ni‐P‐W Layers Investigated by Means of Rutherford Backscattering Spectrometry

Published:1983-11-01 Issue:11 Volume:130 Page:2255-2259
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Svendsen Leo G.¹²³,Osaka Tetsuya¹²³,Koiwa Ichiro¹²³,Sawai Hideo¹²³

Affiliation:

1. Institute of Physics, University of Aarhus, DK‐8000 Aarhus C, Denmark

2. Department of Applied Chemistry, Waseda University, Shinjuku‐ku, Tokyo, Japan

3. OKI Electric Industry Company, Limited, Materials Department, Research Laboratories, Hachioji‐shi, Tokyo, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2119563/pdf

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