Loading Effects on Kinetical and Electrical Aspects of Silane‐Reduced Low‐Pressure Chemical Vapor Deposited Selective Tungsten-Reference-Cited by-同舟云学术

Loading Effects on Kinetical and Electrical Aspects of Silane‐Reduced Low‐Pressure Chemical Vapor Deposited Selective Tungsten

Published:1993-03-01 Issue:3 Volume:140 Page:818-825
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Holleman Jisk¹²,Hasper Albert¹²,Kleijn Chris R.¹²

Affiliation:

1. MESA Institute for Microelectronics, Materials Engineering and Sensors and Actuators, University of Twente, 7500 AE Enschede, The Netherlands

2. Delft University of Technology, Kramers laboratorium voor Fysische Technologie, 2628 BW Delft, The Netherlands

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2056165/pdf

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