Low Current Collapse and Low Leakage GaN MIS-HEMT Using AlN/SiN as Gate Dielectric and Passivation Layer

Author:

Liu Shih Chien,Wong Yuen-Yee,Lin Yueh-Chin,Chang Edward Yi

Abstract

An effective passivation and gate insulator with low current collapse and improved dynamic ON-state resistance (R ON) for GaN MIS-HEMT is demonstrated in this work. The structure of passivation and gate insulator is fabricated by 4-nm SiN as the first passivation layer and 1-nm AlN. The bilayer AlN/SiN structure integrates the advantages of SiN and AlN. SiN passivation has been proved to effectively reduce GaN surface states. AlN has high bandgap of ~6.2 eV which can suppress leakage current. Hence, the unfavorable effects such as trapping effect and leakage current which will induce current collapse and are effectively suppressed by using AlN/SiN bilayer thin film. A GaN MIS-HEMT with AlN/SiN passivation and gate dielectric exhibits improved I‒V characteristics, low leakage current, low current collapse, and improved dynamic R ON at high quiescent drain bias of 100 V.

Publisher

The Electrochemical Society

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3