Atomic Layer Deposition of Silicon Oxide Thin Films by Alternating Exposures to Si[sub 2]Cl[sub 6] and O[sub 3]-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Silicon Oxide Thin Films by Alternating Exposures to Si[sub 2]Cl[sub 6] and O[sub 3]

Published:2008 Issue:7 Volume:11 Page:G23
ISSN:1099-0062
Container-title:Electrochemical and Solid-State Letters
language:en
Short-container-title:Electrochem. Solid-State Lett.

Author:

Lee Seung-Won,Park Kwangchol,Han Byeol,Son Sang-Ho,Rha Sa-Kyun,Park Chong-Ook,Lee Won-Jun

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering

Reference19 articles.

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3. J.-E. Park, J.-H. Ku, J.-W. Lee, J.-H. Yang, K.-S. Chu, S.-H. Lee, M.-H. Park, N.-I. Lee, H.-K. Kang, and K.-P. Suh , in Technical Digest of 2002 International Electron Devices Meeting , IEEE, p. 229 (2002).

4. Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

5. Quasi-monolayer deposition of silicon dioxide

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