Diffusion Barrier Properties of Atomic Layer Deposited Ultrathin Ta[sub 2]O[sub 5] and TiO[sub 2] Films-Reference-Cited by-同舟云学术

Diffusion Barrier Properties of Atomic Layer Deposited Ultrathin Ta[sub 2]O[sub 5] and TiO[sub 2] Films

Published:2006 Issue:4 Volume:153 Page:G304
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Alén Petra,Vehkamäki Marko,Ritala Mikko,Leskelä Markku

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference31 articles.

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4. M. Ritala and M. Leskelä ,Handbook of Thin Film Materials, H. S. Nalwa , Editor, Vol. 1, Chap. 2, Academic Press, San Diego (2001).

5. Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films

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