Leakage Current Distribution and Dielectric Breakdown of Cu-Contaminated Thin SiO[sub 2]-Reference-Cited by-同舟云学术

Leakage Current Distribution and Dielectric Breakdown of Cu-Contaminated Thin SiO[sub 2]

Published:2004 Issue:4 Volume:151 Page:F81
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Tokuda Norio,Nishiguchi Shingo,Yamasaki Satoshi,Miki Kazushi,Yamabe Kikuo

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference36 articles.

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4. Effect of SiO[sub 2] Thickness on Dielectric Breakdown Defect Density Due to Surface Crystal-Originated Particles

5. Time-dependent-dielectric breakdown of thin thermally grown SiO2films

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