Screening of Undesirable Elements Raising the Electrical Resistivity in Very Narrow Cu Wires by Ab Initio Calculation-Reference-Cited by-同舟云学术

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Screening of Undesirable Elements Raising the Electrical Resistivity in Very Narrow Cu Wires by Ab Initio Calculation

Published:2017 Issue:9 Volume:164 Page:D558-D563
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Nagano Takatoshi,Tamahashi Kunihiro,Inami Takashi,Sasajima Yasushi,Onuki Jin

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Reduction in resistivity of 50 nm wide Cu wire by high heating rate and short time annealing utilizing misorientation energy

2. Grain Boundary Segregation in Metals

3. Synthesis and Electron Microscopy of Superalloy Nanowires

4. Effect of the Purity of Plating Materials on the Reduction of Resistivity of Cu wires for Future LSIs

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