Communication—Texture and Bandgap Tuning of Phase Pure Cu2O Thin Films Grown by a Simple Potentiostatic Electrodeposition Technique

Abstract

Highly textured phase pure Cu2O thin films have been grown by a simple electrodeposition technique with varying deposition voltages (−0.3 to −1.0 V). The surface morphology characterized by Scanning Electron Microscopy (SEM) revealed that the deposited thin films coherently carpet the underlying substrate and are composed of sharp faceted well-defined grains of 0.5–1.0 μm sizes. XRD analyses showed that all films are composed of polycrystalline cubic Cu2O phase only and have average crystalline domain size in the range of 30–73 nm. The preferred crystalline orientation of phase pure Cu2O films was found to be changing from (200) to (111) with increasing cathodic voltages and showed the highest (111) and (200) crystalline texture coefficient while growing at −1.0 and −0.8 V respectively. The optical bandgap of the as-grown samples was calculated in the range of 1.95–2.20 eV using UV–vis Transmission data. The performance of Cu2O/FTO photocathodes was tested by estimating LED “ON/OFF” modulated surface photovoltage into a photoelectrochemical cell at a zero bias.