Thermolysis of an Azide‐Phenolic Resin Composite Film and Its Use as an Antireflective Bottom Layer in the Three‐Layer Resist Process-Reference-Cited by-同舟云学术

Thermolysis of an Azide‐Phenolic Resin Composite Film and Its Use as an Antireflective Bottom Layer in the Three‐Layer Resist Process

Published:1987-04-01 Issue:4 Volume:134 Page:963-967
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Iwayanagi Takao¹²,Hashimoto Michiaki¹²,Nonogaki Saburo¹²,Shirai Sei‐ichiro¹²,Moriuchi Noboru¹²

Affiliation:

1. Hitachi Limited, Hitachi Central Research Laboratory, Kokubunji, Tokyo 185, Japan

2. Hitachi Limited, Hitachi Device Development Center, Ohme, Tokyo 198, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2100604/pdf

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