Author:
Yamamoto Jiro,Uchino Shou-ichi,Hattori Takashi,Yoshimura Toshiyuki,Murai Fumio
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
16 articles.
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1. Line width roughness and its control on photomask;SPIE Proceedings;2013-09-09
2. Lithographic Resists;Encyclopedia of Polymer Science and Technology;2012-11-16
3. Fabrication of Micron-sized Organic Field Effect Transistors;Journal of the Korean Vacuum Society;2011-01-30
4. Top-down fabricated silicon nanowire sensors for real-time chemical detection;Nanotechnology;2009-11-30
5. Lithographic Resists;Kirk-Othmer Encyclopedia of Chemical Technology;2005-06-17