Synthesis, Radiation Degradation, and Electron Beam Resist Behavior of Fluorine‐Containing Vinyl Polymers
Author:
Affiliation:
1. Department of Chemistry, University of Alabama, University, Alabama 35486
2. US Army Electronics Technology and Devices Laboratory, Fort Monmouth, New Jersey 07703
3. Motorola SG/SRDL, Phoenix, Arizona 85008
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.2127726/pdf
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