Author:
Setiawan Y.,Balakumar S.,Tan E. J.,Pey K. L.,Lee P. S.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. p-channel SiGe heterostructures for field effect applications
2. SiGe heterostructure CMOS circuits and applications
3. V. Moroz, G. Eneman, P. Verheyen, F. Nouri, L. Washington, L. Smith, M. Jurczak, D. Jurczak, and X. Xu , inInternational Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2005), IEEE Electron Devices Society, p. 143 (2005).
4. Embedded Source/Drain SiGe Stressor Devices on SOI: Integrations, Performance, and Analyses
5. SiGe-channel n-MOSFET by germanium implantation
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