In Situ Optical Analysis of the Gas Phase during the Deposition of Silicon Carbide from Methyltrichlorosilane-Reference-Cited by-同舟云学术

In Situ Optical Analysis of the Gas Phase during the Deposition of Silicon Carbide from Methyltrichlorosilane

Published:1996-05-01 Issue:5 Volume:143 Page:1654-1661
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Ganz M.¹²,Dorval N.¹²,Lefebvre M.¹²,Péalat M.¹²,Loumagne F.¹²,Langlais F.¹²

Affiliation:

1. Laboratoire PRIAM—UMR 9927 ONERA‐CNRS Fort de Palaiseau, F‐91120 Palaiseau, France

2. Laboratoire des Composites Thermostructuraux—UMR 47 CNRS‐SEP‐UB1 Domaine Universitaire, F‐33600 Pessac, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1836694/pdf

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