Controlled Deposition of Organic Contamination and Removal with Ozone-Based Cleanings-Reference-Cited by-同舟云学术

Controlled Deposition of Organic Contamination and Removal with Ozone-Based Cleanings

Published:2001 Issue:3 Volume:148 Page:G118
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Claes M.,De Gendt S.,Kenens C.,Conard T.,Bender H.,Storm W.,Bauer T.,Mertens P.,Heyns M. M.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. K. Saga and T. Hattori, inUltraclean Surface Processing of Silicon Wafers-Secrets of VLSI Processing, T. Hattori, Editor, p. 567, Springer-Verlag, New York (1998).

2. Impact of Organic Contamination on Thin Gate Oxide Quality

3. C. Kenens, S. De Gendt, D. M. Knotter, L. Loewenstein, M. Meuris, W. Vandervorst, and M. Heyns, inCleaning Technology in Semiconductor Device Manufacturing, J. Ruzyllo, R. Novak, C. Apple, T. Hattori, and M. Heyns, Editors, PV 97-35, p. 247, The Electrochemical Society Proceedings Series, Pennington, NJ (1997).

4. S. L. Nelson and L. E. Carter, inProceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces, p. 28, Solid State Phenomena 65/66, Scitec Publications, Ltd., Switzerland (1999).

5. IMEC-IIAP report (March 1999).

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