Al2O3 and HfO2 Atomic Layers Deposited in Single and Multilayer Configurations on Titanium and on Stainless Steel for Biomedical Applications

Abstract

Thin films of alumina and hafnia were prepared by atomic layer deposition, with the aim of investigating the use of such films in biomedical applications. Films were deposited on commercially pure titanium and on medical stainless steel. Two configurations were prepared: single alumina films, 20 nm and 60 nm thick, and a multilayer film, 60 nm thick, consisting of alumina/hafnia/alumina layers, each 20 nm thick. The morphology, structure and composition of the coated alloys were characterized using scanning electron microscopy with energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy. In addition, ellipsometry and atomic force microscopy coupled with scanning Kelvin probe force microscopy, were used to study the thickness and the topography with surface potential properties. An improvised method, involving the Vickers hardness test, was applied to assess the delamination of the deposited films. Coated specimens, as well as bare substrates, were tested at 37 °C in simulated body fluid, using potentiodynamic polarization and electrochemical impedance spectroscopy as techniques for assessing corrosion susceptibility. In general, single and multilayer thin films possess excellent barrier properties and are worth investigating further for biomedical applications. The degree of protection is dependent mainly on film thickness and on the type of substrate, and less on configuration.