Abstract
The change of an internal stress in each layer consisting of AZO/Cu/Mo multilayer thin films with temperature were experimentally measured for the first time by using a grazing incidence X-ray diffraction (GI-XRD). These measurements were performed by taking account of relatively large difference of the total reflection values among AZO(2 wt%Al2O3 + ZnO), Cu and Mo, so that the structural properties of each layer of AZO/Cu/Mo tri-layer can be measured in turn by changing an incident angle of a GI-XRD. It was found that the stress mode of AZO, Cu and Mo single layers were compression, tension and tension, respectively. Their stress mode does not change even after forming multilayers and with successive anneals up to 400 °C. The internal stress of each layer in multilayer tends to decrease to accommodate each thermal mismatch among AZO, Cu and MO layers. It was demonstrated that the internal stress in each layer of the multilayer thin films had been measured with a nondestructive method by using a GI-XRD.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials