O3-TEOS CVD Film Formation on Thermal SiO2Pre-Coated with Ethanol
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference40 articles.
1. A Mechanism for Increasing Growth Rate of Undoped SACVD Film
2. A Conformal Oxide Liner for Through Silicon Vias by Pulsed SA-CVD Deposition
3. Effect of SC-1 Treatment in Thermal Wall Oxide on Nanoscale STI Gap-Filling by O3/TEOS CVD
4. Trench filling characteristics of low stress TEOS/ozone oxide deposited by PECVD and SACVD
5. Deoxidization of Water Desorbed from APCVD TEOS-O[sub 3] SiO[sub 2] Film with Thin Titanium Cap Film
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3. Gap Filling Model of O3-Tetraethylorthosilicate Film Formed on an Underlying Layer Pretreated with Organic Solvent;ECS Journal of Solid State Science and Technology;2013
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