Effect of Additives in Organic Acid Solutions for Post-CMP Cleaning on Polymer Low-k Fluorocarbon-Reference-Cited by-同舟云学术

Effect of Additives in Organic Acid Solutions for Post-CMP Cleaning on Polymer Low-k Fluorocarbon

Published:2009 Issue:6 Volume:156 Page:H409
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Gu Xun,Nemoto Takenao,Teramoto Akinobu,Ito Takashi,Ohmi Tadahiro

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

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5. Structural Studies of High-Performance Low-kDielectric Materials Improved by Electron-Beam Curing

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