Electrical and Physical Characterization of Tetraethylorlthosilicate‐  O 3 Borophosphosilicate Glass

Author:

Iyer R.12,Thakur R. P. S.12,Rhodes H.12,Liao R.12,Rosler R.12,Yieh E.12

Affiliation:

1. Micron Technology, Incorporated, Boise, Idaho 83706

2. Applied Materials, Incorporated, Santa Clara, California 95054

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analysis of waveguide silica glasses using Raman microscopy;Journal of Non-Crystalline Solids;2008-05

2. Rapid Thermal Processing;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09

3. Fabrication of microchannel arrays in borophosphosilicate glass;Journal of Materials Research;2005-03-01

4. The formation of inorganic oxide insulators for use in ULSIs formed from organic sources;Materials Science and Engineering: B;2004-08

5. Growth Kinetics and Deposition‐Related Properties of Subatmospheric Pressure Chemical Vapor Deposited Borophosphosilicate Glass Film;Journal of The Electrochemical Society;1999-08-01

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