Growth Kinetics and Deposition‐Related Properties of Subatmospheric Pressure Chemical Vapor Deposited Borophosphosilicate Glass Film-Reference-Cited by-同舟云学术

Growth Kinetics and Deposition‐Related Properties of Subatmospheric Pressure Chemical Vapor Deposited Borophosphosilicate Glass Film

Published:1999-08-01 Issue:8 Volume:146 Page:3039-3051
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Vassiliev Vladislav Y.¹,Zheng Jia Zhen¹,Tang Shiau Khee²,Lu Wei¹,Hua Ji¹,Lin Yih Shung¹

Affiliation:

1. Chartered Semiconductor Manufacturing, Limited, Research and Development, Singapore 738406

2. Division of Materials Engineering, School of Applied Science, Nanyang Technological University, Singapore 639798

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1392048/pdf

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