Differential Inhibition during Cu Electrodeposition on Ru: Combined Electrochemical and Real-Time TEM Studies-Reference-Cited by-同舟云学术

Differential Inhibition during Cu Electrodeposition on Ru: Combined Electrochemical and Real-Time TEM Studies

Published:2018-11-13 Issue:1 Volume:166 Page:D3129-D3135
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Vereecken P. M.^ORCID,Radisic A.^ORCID,Ross F. M.^ORCID

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference23 articles.

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4. Electrochemical Processing in ULSI Fabrication and Semiconductor/Metal Deposition II;Deligianni;Electrochemical Society Proceedings,1999

5. Electrochemical Processing in ULSI and MEMS;Fang;Electrochemical Society Proceedings,2005

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