A Statistical Process Control Method for Semiconductor Manufacturing-Reference-Cited by-同舟云学术

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A Statistical Process Control Method for Semiconductor Manufacturing

Published:2009-07-01 Issue:4 Volume:2 Page:246-254
ISSN:1882-4889
Container-title:SICE Journal of Control, Measurement, and System Integration
language:en
Short-container-title:SICE Journal of Control, Measurement, and System Integration

Author:

Kubo Tomoaki¹²,Ino Tomomi²,Minami Kazuhiro³,Minami Masateru⁴⁵,Homma Tetsuya⁴

Affiliation:

1. Postgraduate Courses of Functional Control Systems, Shibaura Institute of Technology

2. Corporate Manufacturing Engineering Center, Toshiba Corporation

3. Oita Operations, Toshiba Corporation

4. Department of Electronic Engineering, Shibaura Institute of Technology

5. Research Center for Advanced Science and Technology, University of Tokyo

Publisher

Informa UK Limited

Link

https://www.tandfonline.com/doi/pdf/10.9746/jcmsi.2.246

Reference19 articles.

1. [1] Y.-M. Chou, A.M. Polansky, and R.L. Mason: Transforming non-normal data to normality in statistical process control, Journal of Quality Technology, Vol. 30, No. 2, pp. 133-141, Apr. 1998.

2. [2] G.E.P. Box and D.R. Cox: An analysis of transformations, Journal of the Royal Statistical Society, Series B (Methodological), Vol. 26, No. 2, pp. 211-252, 1964.

3. [3] R.M. Sakia: The Box-Cox transformation technique: A review, The Statistician, Vol. 41, No. 2., pp. 169-178, 1992.

4. [4] J.A. Clements: Process capability calculations, for non-normal distributions, Quality Progress, Vol.22, pp. 95-100, 1989.

5. [5] S.E. Ahmed: Assessing the process capability index for non-normal processes, Journal of Statistical Planning and Inference, Vol. 129, No. 1-2, pp. 195-206, Feb. 2005.

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1. Sequential and Comprehensive Algorithm for Fault Detection in Semiconductor Sensors;Applied Sciences;2021-11-05

2. An Outlier Removal Method for SPC in Semiconductor Manufacturing;SICE Journal of Control, Measurement, and System Integration;2010-07-01

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