Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate-Reference-Cited by-同舟云学术

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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Published:2019-09-28 Issue:151 Volume: Page:
ISSN:1940-087X
Container-title:Journal of Visualized Experiments
language:en
Short-container-title:JoVE

Author:

Fernandes Silvia L.,Affonço Lucas J.,Junior Roberto A. R.,da Silva José H. D.,Longo Elson,Graeff Carlos F. de O.

Publisher

MyJove Corporation

Subject

General Immunology and Microbiology,General Biochemistry, Genetics and Molecular Biology,General Chemical Engineering,General Neuroscience

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High performance bilayer MoTe2 transistors with co-sputtered ternary HfAlO2 high-k dielectric;Applied Physics Letters;2024-03-18

2. Deposition rate and optical emissions in niobium oxide processes by reactive sputtering;Journal of Vacuum Science & Technology A;2024-03-11

3. Study of tantalum-based coatings magnetron sputtered on NiTi alloy in argon and argon/nitrogen atmosphere;Ceramics International;2024-02

4. In vitro assessment of corrosion resistance and biocompatibility of tantalum-niobium oxide surface-functionalized Mg alloy;Materials Chemistry and Physics;2023-06

5. Biocompatibility and corrosion evaluation of niobium oxide coated AZ31B alloy for biodegradable implants;Colloids and Surfaces B: Biointerfaces;2022-04

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