Performance of a 1.35NA ArF immersion lithography system for 40-nm applications
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SPIE
Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High throughput observation of latent images on resist using laser-based photoemission electron microscopy;Applied Physics Express;2024-08-01
2. Design of an objective for a hyper-numerical-aperture immersion lithography tool with a multi-step alternative grouping design method;Applied Optics;2022-05-23
3. Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography;Handbook of Laser Micro- and Nano-Engineering;2021
4. Nano - Precision Systems for Overlay in Advanced Lithography Processes;Proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing;2019
5. Simulation and experiment studies of aberration effects on the measurement of laser beam quality factor ( M 2 );Optics and Lasers in Engineering;2018-01
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