Polarization effects associated with hyper-numerical-aperture <inline-formula><math display="inline" altimg="none" overflow="scroll"><mrow><mo>(</mo><mo>></mo><mn>1</mn><mo>)</mo></mrow></math></inline-formula> lithography-Reference-Cited by-同舟云学术

Polarization effects associated with hyper-numerical-aperture $(> 1)$ lithography

Published:2005-07-01 Issue:3 Volume:4 Page:031104
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Geh Bernd

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference15 articles.

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4. E. Hecht ,Optics, Addison Wesley, 2nd ed., Reading, MA (1990).

5. A New Calculus for the Treatment of Optical SystemsI Description and Discussion of the Calculus

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