Strict mathematical model of mechanical stress birefringence for optical plates-Reference-Cited by-同舟云学术

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Strict mathematical model of mechanical stress birefringence for optical plates

Published:2021-10-06 Issue:29 Volume:60 Page:9117
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Zhou Ruyi,Liu Tiecheng,Zhang Linghao^ORCID,Hu Jingpei,Zhu Linglin,Zeng Aijun,Huang Huijie

Funder

International Science and Technology Cooperation Programme

National Natural Science Foundation of China

Integrated Circuit Major Science and Technology Project of Shanghai

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference22 articles.

1. Immersion and dry scanner extensions for sub-10nm production nodes

2. Challenges with hyper-NA (NA>1.0) polarized light lithography for sub lambda/4 resolution

3. Polarization effects associated with hyper-numerical-aperture $(> 1)$ lithography

4. Mask substrate birefringence requirements for hyper-NA lithography

5. Investigation of substrate birefringence effects on optical-disk performance

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