Development of high coherence high power 193nm laser

Author:

Tanaka Satoshi,Arakawa Masaki,Fuchimukai Atsushi,Sasaki Yoichi,Onose Takashi,Kamba Yasuhiro,Igarashi Hironori,Qu Chen,Tamiya Mitsuru,Oizumi Hiroaki,Ito Shinji,Kakizaki Koji,Xuan Hongwen,Zhao Zhigang,Kobayashi Yohei,Mizoguchi Hakaru

Publisher

SPIE

Reference9 articles.

1. Green solution: 120W ArF immersion light source supporting the next-generation multiple –patterning lithography,;Kumazaki,2015

2. Latest advances in high brightness disk lasers,;Kuhn,2015

3. Improvement of laser-induced damage tolerance in CsLiB6O10 for high-power UV laser source,;Nishioka,2003

4. High-power, high-repetition UV beam generation with an all-solid-state laser,;Katsura,2007

5. All-solid-state, high-power, deep-UV laser system based on cascaded sum-frequency mixing in CsLiB_6O_10 crystals

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