Author:
Tanaka Satoshi,Arakawa Masaki,Fuchimukai Atsushi,Sasaki Yoichi,Onose Takashi,Kamba Yasuhiro,Igarashi Hironori,Qu Chen,Tamiya Mitsuru,Oizumi Hiroaki,Ito Shinji,Kakizaki Koji,Xuan Hongwen,Zhao Zhigang,Kobayashi Yohei,Mizoguchi Hakaru
Reference9 articles.
1. Green solution: 120W ArF immersion light source supporting the next-generation multiple –patterning lithography,;Kumazaki,2015
2. Latest advances in high brightness disk lasers,;Kuhn,2015
3. Improvement of laser-induced damage tolerance in CsLiB6O10 for high-power UV laser source,;Nishioka,2003
4. High-power, high-repetition UV beam generation with an all-solid-state laser,;Katsura,2007
5. All-solid-state, high-power, deep-UV laser system based on cascaded sum-frequency mixing in CsLiB_6O_10 crystals
Cited by
15 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献