Overlay quality metric

Author:

Cohen Guy,Amit Eran,Klein Dana,Kandel Daniel,Levinski Vladimir B.

Publisher

SPIE

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Image-based overlay target design using a grating intersection;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-09-05

2. Improve overlay performance against process variation impact by using overlay metrology recipe optimization;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12

3. OPO Measurement Improvement in Advanced DRAM with Tunable Wavelength Imaging;2020 International Workshop on Advanced Patterning Solutions (IWAPS);2020-11-05

4. Optical Imaging Metrology Calibration using High Voltage Scanning Electron Microscope at After-Development Inspection for Advanced Processes;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

5. Overlay and stitching metrology for massively parallel electron-beam lithography (Conference Presentation);Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-22

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