Fabrication of Step and Flash imprint lithography templates using commercial mask processes
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SPIE
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanohole and dot patterning processes on quartz substrate byR–θ electron beam lithography and nanoimprinting;Japanese Journal of Applied Physics;2016-05-23
2. A master-mold fabrication by electron beam lithography followed by nanoimprinting and self-aligned double patterning;Japanese Journal of Applied Physics;2014-05-27
3. Linewidth roughness characterization in step and flash imprint lithography;SPIE Proceedings;2008-05-30
4. Minimizing linewidth roughness for 22-nm node patterning with step-and-flash imprint lithography;SPIE Proceedings;2008-03-14
5. Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008
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