Actinic review of EUV masks: status and recent results of the AIMSTMEUV System
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Reference6 articles.
1. A. Erdmann, P. Evanschitzky, T. Bret, R. Jonckheere, Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83220E (March 29, 2012); doi: 10.1117/12.916411
2. I. Mochi, K.A. Goldberg, R. Xie, P.Y. Yan, K. Yamazoe, Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79691X (April 07, 2011); doi:10.1117/12.881652
3. D. Hellweg, J. Ruoff, A. Herkommer, J. Stühler, T. Ihl, H. Feldmann, M. Ringel, U. Stroßner, S. Perlitz, W. Harnisch, Proc. of SPIE - The International Society for Optical Engineering (Impact Factor: 0.2). 03/2011; DOI: 10.1117/12.879422
4. A. Garetto, R. Capelli, K. Magnusson, J.H. Peters, S. Perlitz, U. Matejka, D. Hellweg, M. Weiss, M. Goldstein, Proc. SPIE 9235, Photomask Technology 2014, 92350N (October 29 2014); doi:10.1117/12.2068308
5. R. Capelli, A. Garetto, K. Magnusson, T. Scherübl, SPIE 9231, 30th European Mask and Lithography Conference, 923109 (17 October 2014); doi: 10.1117/12.2067578
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