Printability and actinic AIMS review of programmed mask blank defects-Reference-Cited by-同舟云学术

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Printability and actinic AIMS review of programmed mask blank defects

Published:2017-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Verduijn Erik¹,Mangat Pawitter¹,Wood Obert¹,Rankin Jed¹,Chen Yulu¹,Goodwin Francis¹,Capelli Renzo²,Perlitz Sascha²,Hellweg Dirk²,Bonam Ravi³,Matham Shravan³,Felix Nelson³,Corliss Daniel³

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

2. Carl Zeiss SMT GmbH (Germany)

3. IBM Corp. (United States)

Publisher

SPIE

Reference15 articles.

1. Printability of buried mask defects in extreme UV lithography;Hsu,2011

2. Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application;Huh,2011

3. EUV mask multilayer defects and their printability under different multilayer deposition conditions

4. Defect printability studies at SEMATECH;Jang,2011

5. Mitigation of EUV mask blank substrate pit and scratch defects by Accelerated Neutral Atom Beam (ANAB) processing;Walsh,2012

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Rapid profile reconstruction of phase defects via machine-learning regression model;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

2. Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-12-03

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