MPC strategies for multi-beam mask writers-Reference-Cited by-同舟云学术

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MPC strategies for multi-beam mask writers

Published:2019-08-29 Issue: Volume: Page:
ISSN:
Container-title:35th European Mask and Lithography Conference (EMLC 2019)
language:
Short-container-title:

Author:

Bork Ingo,Buck Peter

Publisher

SPIE

Reference8 articles.

1. 50-keV electron multibeam mask writer for the 11-nm HP node: first results of the proof-of-concept electron multibeam mask exposure tool

2. Multi-beam mask writer MBM-1000 and its application field;Matsumoto,2016

3. MBMW-101: World’s 1st high-throughput multi-beam mask writer;Klein,2016

4. Sub-15nm template fabrication with multi-beam mask writer (Conference Presentation);Ichimura,2018

5. Global Critical Dimension Correction: II

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multi-beam mask writer exposure optimization for EUV mask stacks;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-10-28

2. Machine learning guided curvilinear MPC;Photomask Technology 2019;2019-10-03

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