Defect inspection for imprint lithography using a die-to-database electron beam verification system-Reference-Cited by-同舟云学术

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Defect inspection for imprint lithography using a die-to-database electron beam verification system

Published:2006-03-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Myron L. Jeff,Thompson Ecron,McMackin Ian,Resnick Douglas J.,Kitamura Tadashi,Hasebe Toshiaki,Nakazawa Shinichi,Tokumoto Toshifumi,Ainley Eric,Nordquist Kevin,Dauksher William J.

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoimprint lithography;Nanolithography;2014

2. An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography;SPIE Proceedings;2007-03-16

3. Direct die-to-database electron-beam inspection of fused silica imprint templates;SPIE Proceedings;2006-10-06

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