An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography-Reference-Cited by-同舟云学术

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An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Dauksher W. J.,Le N. V.,Gehoski K. A.,Ainley E. S.,Nordquist K. J.,Joshi N.

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Directed self-assembly of block copolymers for use in bit patterned media fabrication;Journal of Physics D: Applied Physics;2013-11-26

2. Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-07-01

3. Materials and Processes in UV-Assisted Nanoimprint Lithography;Generating Micro- and Nanopatterns on Polymeric Materials;2011-03-19

4. Nanoimprint lithography: An old story in modern times? A review;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008

5. Nanoimprint Materials Systems;Journal of Photopolymer Science and Technology;2008

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