Author:
Tasdemir Zuhal,Mochi Iacopo,van Lent-Protasova Lidia,Meeuwissen Marieke,Custers Rolf,Rispens Gijsbert,Hoefnagels Rik,Ekinci Yasin,Wang Xiaolong
Reference10 articles.
1. EUV high-NA scanner and mask optimization for sub-8nm resolution;van Schoot,2016
2. High-NA EUV lithography enabling Moore’s law in the next decade;van Schoot,2017
3. High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond
4. Photolithography reaches 6 nm half-pitch using EUV light;Fan,2016
5. State-of-the-art EUV materials and processes for the 7nm node and beyond;Buitrago,2017
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