Challenges of implementing contour modeling in 32nm technology
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SPIE
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer;Frontiers of Mechanical Engineering;2024-07-19
2. Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-10-19
3. Can remote SEM contours be used to match various SEM tools in fabs?;Metrology, Inspection, and Process Control XXXVII;2023-04-27
4. Optimal OPC model selection with SEM image contours;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21
5. Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-07-19
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