Study of novel EUVL mask absorber candidates-Reference-Cited by-同舟云学术

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Study of novel EUVL mask absorber candidates

Published:2021-05-03 Issue:02 Volume:20 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Wu Meiyi¹,Thakare Devesh¹,de Marneffe Jean-François¹,Jaenen Patrick¹,Souriau Laurent¹,Opsomer Karl¹,Soulié Jean-Philippe¹,Erdmann Andreas²,Mesilhy Hazem²,Naujok Philipp³,Foltin Markus⁴,Soltwisch Victor⁵,Saadeh Qais⁵,Philipsen Vicky¹

Affiliation:

1. Interuniversity Microelectronics Centre, Leuven

2. Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen

3. optiX fab GmbH, Jena

4. Süss MicroTec Photomask Equipment GmbH & Co. KG, Sternenfels

5. Physikalisch-Technische Bundesanstalt, Berlin

Publisher

SPIE-Intl Soc Optical Eng

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Continued dimensional scaling through projection lithography;Micro and Nano Engineering;2024-06

2. Mask innovations on the eve of high NA EUV lithography;Japanese Journal of Applied Physics;2024-04-01

3. Patterning Infrastructure Development for Advanced EUV Lithography: Continuing Dimensional Scaling Through EUV Lithography to Support Moore’s Law;IEEE Electron Devices Magazine;2024-03

4. Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature;Nanotechnology;2024-02-27

5. Identifying new absorber materials for EUV photomasks;Photomask Technology 2023;2023-11-21

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