Study of novel EUVL mask absorber candidates-Reference-Cited by-同舟云学术

Study of novel EUVL mask absorber candidates

Published:2021-05-03 Issue:02 Volume:20 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Wu Meiyi¹,Thakare Devesh¹,de Marneffe Jean-François¹,Jaenen Patrick¹,Souriau Laurent¹,Opsomer Karl¹,Soulié Jean-Philippe¹,Erdmann Andreas²,Mesilhy Hazem²,Naujok Philipp³,Foltin Markus⁴,Soltwisch Victor⁵,Saadeh Qais⁵,Philipsen Vicky¹

Affiliation:

1. Interuniversity Microelectronics Centre, Leuven

2. Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen

3. optiX fab GmbH, Jena

4. Süss MicroTec Photomask Equipment GmbH & Co. KG, Sternenfels

5. Physikalisch-Technische Bundesanstalt, Berlin

Publisher

SPIE-Intl Soc Optical Eng

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Identifying new absorber materials for EUV photomasks;Photomask Technology 2023;2023-11-21

2. Exploring photomask etching capabilities for new extreme ultraviolet absorber materials;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29

3. Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-04-17

4. Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks;Photomask Technology 2022;2022-12-01

5. Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-25