Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography-Reference-Cited by-同舟云学术

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Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Umeda Hiroshi,Tsushima Hiroaki,Watanabe Hidenori,Tanaka Satoshi,Yoshino Masaya,Matsumoto Shinich,Tanaka Hiroshi,Kurosu Akihiko,Kawasuji Yasufumi,Matsunaga Takashi,Fujimoto Junichi,Mizoguchi Hakaru

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source;Journal of Applied Physics;2015-11-21

2. Advanced excimer laser technologies enable green semiconductor manufacturing;SPIE Proceedings;2014-03-31

3. Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography;SPIE Proceedings;2013-04-12

4. A reliable higher power ArF laser with advanced functionality for immersion lithography;SPIE Proceedings;2012-02-21

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