1. (*1: Gigaphoton Inc, *2: Tokyo University of science, *3: Institute for Solid State Physics, University of Tokyo, *4: Chinese Academy of Science): “Development of a hybrid ArF laser system for lithography;Onose*1,2013
2. Power up: 120Watt Injection-Lock ed ArF excimer laser required for both multi-patterning and 450 mm wafer lithography;Asayama*,2013
3. Reliability report of high power Injection-Lock laser light source for double exposure and double patterning ArF immersion lithography;Tsushima,2009
4. Ecology and high-durability Injection-Lock ed laser with flexible power for double-patterning ArF immersion lithography;Umeda*,2011