Author:
Suzuki Kazuaki,Fujiwara Tomoharu,Hada Kazunari,Hirayanagi Noriyuki,Kawata Shintaro,Morita Kenji,Okamoto Kazuya,Okino Teruaki,Shimizu Sumito,Yahiro Takehisa,Yamamoto Hajime
Cited by
17 articles.
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1. Mask Repair;Handbook of Photomask Manufacturing Technology;2005-04-07
2. Status and issues of electron projection lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-01-01
3. Status and issues of EPL;SPIE Proceedings;2004-08-20
4. Resist outgassing in electron projection lithography;SPIE Proceedings;2004-05-20
5. Preliminary results of EB stepper in the application of 65-nm process;SPIE Proceedings;2004-05-20